Invention Grant
US07655376B2 Process for producing photonic crystals and controlled defects therein
失效
光子晶体的生产过程及其中的受控缺陷
- Patent Title: Process for producing photonic crystals and controlled defects therein
- Patent Title (中): 光子晶体的生产过程及其中的受控缺陷
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Application No.: US10596186Application Date: 2003-12-05
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Publication No.: US07655376B2Publication Date: 2010-02-02
- Inventor: Mark T. Anderson , Catherine A. Leatherdale , D. Scott Thompson
- Applicant: Mark T. Anderson , Catherine A. Leatherdale , D. Scott Thompson
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Lucy C. Weiss
- International Application: PCT/US03/38775 WO 20031205
- International Announcement: WO2005/066672 WO 20050721
- Main IPC: G03C9/08
- IPC: G03C9/08

Abstract:
A process comprises (a) providing a substantially inorganic photoreactive composition comprising (1) at least one cationically reactive species, (2) a multi-photon photoinitiator system, and 10 (3) a plurality of precondensed, inorganic nanoparticles; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; (c) exposing at least a portion of the non-reacted portion of the photoreactive composition to radiation of appropriate wavelength and intensity to cause multi-photon absorption and photoreaction to form additional reacted portion; (d) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space; and (e) at least partially filling the interstitial void space with at least one material having a refractive index that is different from the refractive index of the remaining portion.
Public/Granted literature
- US20070282030A1 Process for Producing Photonic Crystals and Controlled Defects Therein Public/Granted day:2007-12-06
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