Invention Grant
- Patent Title: Composition for forming a photosensitive organic anti-reflective layer and method of forming a pattern using the same
- Patent Title (中): 用于形成光敏有机抗反射层的组合物和使用其形成图案的方法
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Application No.: US11600111Application Date: 2006-11-16
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Publication No.: US07655389B2Publication Date: 2010-02-02
- Inventor: Sang-Woong Yoon , Jong-Chan Lee , Ki-Ok Kwon , Sang-Ho Cha , Geun Huh
- Applicant: Sang-Woong Yoon , Jong-Chan Lee , Ki-Ok Kwon , Sang-Ho Cha , Geun Huh
- Applicant Address: KR Suwon-Si, Gyeonggi-Do KR Seoul
- Assignee: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- Current Assignee: Samsung Electronics Co., Ltd.,Seoul National University Industry Foundation
- Current Assignee Address: KR Suwon-Si, Gyeonggi-Do KR Seoul
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2005-0110044 20051117
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/039 ; H01L21/30 ; C08F220/12
Abstract:
A composition for forming a photosensitive organic anti-reflective layer includes about 0.5 to about 5 percent by weight of an acid-labile thermal cross-linking agent that is decomposed by an epoxy group and a photo-acid generator, about 10 to about 22 percent by weight of a copolymer resin that includes an acrylate monomer containing anthracene or a methacrylate monomer containing anthracene, about 0.1 to about 1 percent by weight of a photo-acid generator, and a solvent.
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