Invention Grant
- Patent Title: Manufacturing method of display device and exposure system for that
- Patent Title (中): 显示装置和曝光系统的制造方法
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Application No.: US11878397Application Date: 2007-07-24
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Publication No.: US07655510B2Publication Date: 2010-02-02
- Inventor: Yoshiaki Nakayoshi , Takahiro Miyazaki , Jun Ooida , Ken Ohara
- Applicant: Yoshiaki Nakayoshi , Takahiro Miyazaki , Jun Ooida , Ken Ohara
- Applicant Address: JP Chiba
- Assignee: Hitachi Displays, Ltd.
- Current Assignee: Hitachi Displays, Ltd.
- Current Assignee Address: JP Chiba
- Agency: Stites & Harbison PLLC
- Agent Juan Carlos A. Marquez, Esq.
- Priority: JP2006-218541 20060810
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84

Abstract:
A display panel manufacturing method in which forming a thin film on a substrate and etching the thin film are repeated a plurality of times to form on the substrate a plurality of scanning signal lines, a plurality of video signal lines that three-dimensionally intersects the plurality of scanning signal lines with an insulating layer between them, and TFT elements and pixel electrodes each disposed in a pixel area enclosed with two adjacent scanning signal lines and two adjacent video signal lines. The method also includes: exposing a resist film using exposure dimensions numerically expressed based on design patterns prepared in advance; etching the thin film using etching resists formed by developing the exposed resist film so as to form thin-film patterns; and correcting the design patterns according to the complete dimensions of the formed thin-film patterns.
Public/Granted literature
- US20080036987A1 Manufacturing method of display device and exposure system for that Public/Granted day:2008-02-14
Information query
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