Invention Grant
- Patent Title: Image sensor and method of fabricating the same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US12004687Application Date: 2007-12-20
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Publication No.: US07655545B2Publication Date: 2010-02-02
- Inventor: Joon Hwang
- Applicant: Joon Hwang
- Applicant Address: KR Seoul
- Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee: Dongbu HiTek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: The Law Offices of Andrew D. Fortney
- Agent Andrew D. Fortney
- Priority: KR10-2006-0136251 20061228
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
An image sensor includes a first photodiode formed in a semiconductor substrate at a depth reachable by red light, a second photodiode disposed on or over the first photodiode in the semiconductor substrate at a depth reachable by blue light, a third photodiode disposed adjacent to the second photodiode, a plug connected to the first photodiode, transistor structures on the semiconductor substrate and electrically connected with the first, second and third diodes, an insulating layer covering the transistor structures, and microlenses on the insulating layer.
Public/Granted literature
- US20080157249A1 Image sensor and method of fabricating the same Public/Granted day:2008-07-03
Information query
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