Invention Grant
- Patent Title: Wiring board, manufacturing method thereof, semiconductor device and manufacturing method thereof
- Patent Title (中): 接线板及其制造方法,半导体器件及其制造方法
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Application No.: US12203767Application Date: 2008-09-03
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Publication No.: US07655560B2Publication Date: 2010-02-02
- Inventor: Yoshiyuki Kurokawa
- Applicant: Yoshiyuki Kurokawa
- Applicant Address: JP Atsugi-shi, Kanagawa-Ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-Ken
- Agency: Nixon Peabody, LLP
- Agent Jeffrey L. Costellia
- Priority: JP2003-287206 20030805
- Main IPC: H01L21/4763
- IPC: H01L21/4763

Abstract:
The invention provides a wiring board having a small-scale and high-performance functional circuit while realizing a multi-layer wiring with a small number of steps. In addition, the invention provides a semiconductor device in which a display device is integrated with such high-performance functional circuit on the same substrate. According to the invention, first to third wirings, first and second interlayer insulating films and first and second contact holes are formed over a substrate having an insulating surface. The second wiring is wider than the first wiring, or the third wiring is wider than the first wiring or the second wiring. The second contact hole has a larger diameter than the first contact hole.
Public/Granted literature
- US20090004846A1 WIRING BOARD, MANUFACTURING METHOD THEREOF, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2009-01-01
Information query
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