Invention Grant
- Patent Title: Radiation resistant polypropylene materials
- Patent Title (中): 耐辐射聚丙烯材料
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Application No.: US11743423Application Date: 2007-05-02
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Publication No.: US07655723B2Publication Date: 2010-02-02
- Inventor: Mike Musgrave
- Applicant: Mike Musgrave
- Applicant Address: US TX Houston
- Assignee: Fina Technology, Inc.
- Current Assignee: Fina Technology, Inc.
- Current Assignee Address: US TX Houston
- Agent Tenley R. Krueger; Diane L. Kilpatrick-Lee
- Main IPC: C08L23/14
- IPC: C08L23/14

Abstract:
A polypropylene material is provided having increased radiation resistance compared to solely isotactic polypropylene. The material is formed by utilizing a syndiotactic polypropylene. The isotactic polypropylene may be an isotactic metallocene or Ziegler-Natta catalyzed polypropylene and may include an amount of syndiotactic polypropylene. The material may be used in forming a variety of materials that may undergo exposure to radiation, such as sterilization procedures using radiation. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.
Public/Granted literature
- US20080275180A1 Radiation Resistant Polypropylene Materials Public/Granted day:2008-11-06
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