Invention Grant
- Patent Title: Method of forming thin film
- Patent Title (中): 薄膜形成方法
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Application No.: US11231992Application Date: 2005-09-22
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Publication No.: US07655742B2Publication Date: 2010-02-02
- Inventor: Takayuki Araki , Tetsuhiro Kodani
- Applicant: Takayuki Araki , Tetsuhiro Kodani
- Applicant Address: JP Osaka
- Assignee: Daikin Industries, Ltd.
- Current Assignee: Daikin Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Sughrue Mion, PLLC
- Priority: JP2003-086179 20030326; JP2003-422989 20031219
- Main IPC: C08F14/18
- IPC: C08F14/18

Abstract:
There is provided a method of forming a thin film of vinylidene fluoride homopolymer having crystal form I which is applicable to various substrates in relatively easy way (coating conditions, application method, etc.), a process for preparing a vinylidene fluoride homopolymer having crystal form I efficiently at high purity, and novel vinylidene fluoride homopolymers which can give a thin film being excellent in ferroelectricity. The method of forming a thin film of vinylidene fluoride homopolymer comprises (i) a step for preparing a green powder product of vinylidene fluoride homopolymer comprising crystal form I alone or as main component by subjecting vinylidene fluoride to radical polymerization in the presence of a bromine compound or iodine compound having 1 to 20 carbon atoms which contains at least one moiety represented by —CRf1Rf2X1, wherein X1 is iodine atom or bromine atom; Rf1 and Rf2 are the same or different and each is selected from fluorine atom or perfluoroalkyl groups having 1 to 5 carbon atoms and (ii) a step for forming a thin film on a substrate surface by using vinylidene fluoride homopolymer which comprises crystal form I alone or as main component and is obtained from the green powder product of vinylidene fluoride homopolymer comprising crystal form I alone or as main component.
Public/Granted literature
- US20060014912A1 Method of forming thin film Public/Granted day:2006-01-19
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