Invention Grant
- Patent Title: Charged particle beam equipment
- Patent Title (中): 带电粒子束设备
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Application No.: US11920132Application Date: 2006-05-11
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Publication No.: US07655905B2Publication Date: 2010-02-02
- Inventor: Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
- Applicant: Ken Harada , Tetsuya Akashi , Yoshihiko Togawa , Tsuyoshi Matsuda , Noboru Moriya
- Applicant Address: JP Saitama
- Assignee: Riken
- Current Assignee: Riken
- Current Assignee Address: JP Saitama
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2005-139495 20050512
- International Application: PCT/JP2006/309466 WO 20060511
- International Announcement: WO2006/121108 WO 20061116
- Main IPC: G21K5/10
- IPC: G21K5/10 ; G01N23/00

Abstract:
Charged particle beam equipment having a rotary mechanism in which shift of the observing/machining position incident to the rotary operation of the equipment having the rotary mechanism can be corrected conveniently with high precision in a plane perpendicular to the optical axis of the optical system of charged particle beam or in a slightly inclining plane. An X-Y shift incident to rotation in a plane is determined from the angular information of a rotary mechanism such as a sample holder, diaphragms or biprisms in the charged particle beam equipment, and then driving or controlling is performed to cancel the X-Y shift.
Public/Granted literature
- US20090045339A1 Charged particle beam equipment Public/Granted day:2009-02-19
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