Invention Grant
- Patent Title: Spherical aberration corrected electrostatic lens, input lens, electron spectrometer, photoemission electron microscope and measuring system
- Patent Title (中): 球面像差校正静电透镜，输入透镜，电子光谱仪，光电子显微镜和测量系统
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Application No.: US11631296Application Date: 2004-11-09
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Publication No.: US07655923B2Publication Date: 2010-02-02
- Inventor: Hiroshi Daimon , Hiroyuki Matsuda , Makoto Kato , Masato Kudo
- Applicant: Hiroshi Daimon , Hiroyuki Matsuda , Makoto Kato , Masato Kudo
- Applicant Address: JP Nara JP Tokyo
- Assignee: National University Corporation Nara Institute of Science and Technology,Jeol, Ltd.
- Current Assignee: National University Corporation Nara Institute of Science and Technology,Jeol, Ltd.
- Current Assignee Address: JP Nara JP Tokyo
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2004-208926 20040715
- International Application: PCT/JP2004/016602 WO 20041109
- International Announcement: WO2006/008840 WO 20060126
- Main IPC: G21K1/08
- IPC: G21K1/08 ; H01J3/14 ; H01J3/26 ; H01J49/42
Abstract:
A mesh (M) having an ellipsoid shape or a shape close to the ellipsoid shape is attached to an electrode (EL1) among electrodes (EL1 to ELn). Voltages of the later-stage electrodes (EL2 to ELn) are appropriately set. With this arrangement, a local negative spherical aberration generated by the mesh (M) is cancelled out with a positive spherical aberration. This optimizes an electric field distribution. As a result, this realizes an electrostatic lens whose acceptance angle is extended to about ±60°.
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