Invention Grant
- Patent Title: Storage node including diffusion barrier layer, phase change memory device having the same and methods of manufacturing the same
- Patent Title (中): 存储节点包括扩散阻挡层,相变存储器件及其制造方法
-
Application No.: US11984763Application Date: 2007-11-21
-
Publication No.: US07655940B2Publication Date: 2010-02-02
- Inventor: Jong-bong Park , Woong-chul Shin , Jang-ho Lee
- Applicant: Jong-bong Park , Woong-chul Shin , Jang-ho Lee
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2006-0120104 20061130
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
A phase change memory device and a method of manufacturing the phase change memory device are provided. The phase change memory device may include a switching element and a storage node connected to the switching element, wherein the storage node includes a bottom electrode and a top electrode, a phase change layer interposed between the bottom electrode and the top electrode, and a titanium-tellurium (Ti—Te)-based diffusion barrier layer interposed between the top electrode and the phase change layer. The Ti—Te based diffusion barrier layer may be a TixTe1−x layer wherein x may be greater than 0 and less than 0.5.
Public/Granted literature
Information query
IPC分类: