Invention Grant
US07655940B2 Storage node including diffusion barrier layer, phase change memory device having the same and methods of manufacturing the same 有权
存储节点包括扩散阻挡层,相变存储器件及其制造方法

Storage node including diffusion barrier layer, phase change memory device having the same and methods of manufacturing the same
Abstract:
A phase change memory device and a method of manufacturing the phase change memory device are provided. The phase change memory device may include a switching element and a storage node connected to the switching element, wherein the storage node includes a bottom electrode and a top electrode, a phase change layer interposed between the bottom electrode and the top electrode, and a titanium-tellurium (Ti—Te)-based diffusion barrier layer interposed between the top electrode and the phase change layer. The Ti—Te based diffusion barrier layer may be a TixTe1−x layer wherein x may be greater than 0 and less than 0.5.
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