Invention Grant
US07655945B2 Real-time monitoring of particles in semiconductor vacuum environment 有权
半导体真空环境中颗粒的实时监测

Real-time monitoring of particles in semiconductor vacuum environment
Abstract:
An apparatus includes semiconductor processing equipment. A particle detecting integrated circuit is positioned in a vacuum environment, the particle detecting integrated circuit containing a device having a pair of conductive lines exposed to the vacuum environment. The pair of conductive lines is spaced at a critical pitch corresponding to diameters of particles of interest. A computer system is linked to the particle detecting integrated circuit to detect a change in an electrical property of the conductive lines when a particle becomes lodged between or on the lines.
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