Invention Grant
US07655960B2 A1xInyGa1-x-yN mixture crystal substrate, method of growing same and method of producing same
有权
AlxInyGa1-x-yN混合晶体基板,其生长方法及其制造方法
- Patent Title: A1xInyGa1-x-yN mixture crystal substrate, method of growing same and method of producing same
- Patent Title (中): AlxInyGa1-x-yN混合晶体基板,其生长方法及其制造方法
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Application No.: US11501817Application Date: 2006-08-10
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Publication No.: US07655960B2Publication Date: 2010-02-02
- Inventor: Seiji Nakahata , Ryu Hirota , Kensaku Motoki , Takuji Okahisa , Kouji Uematsu
- Applicant: Seiji Nakahata , Ryu Hirota , Kensaku Motoki , Takuji Okahisa , Kouji Uematsu
- Applicant Address: JP Osaka
- Assignee: Sumito Electric Industries, Ltd.
- Current Assignee: Sumito Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2001-284323 20010919; JP2002-230925 20020808
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
Seeds are implanted in a regular pattern upon an undersubstrate. An AlxInyGa1−x−yN (0≦x≦1, 0≦y≦1, 0
Public/Granted literature
- US20060273343A1 A1xInyGa1-x-yN mixture crystal substrate, method of growing same and method of producing same Public/Granted day:2006-12-07
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