Invention Grant
US07655976B2 Field effect transistors having protruded active regions and methods of fabricating such transistors
有权
具有突出的有源区的场效应晶体管和制造这种晶体管的方法
- Patent Title: Field effect transistors having protruded active regions and methods of fabricating such transistors
- Patent Title (中): 具有突出的有源区的场效应晶体管和制造这种晶体管的方法
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Application No.: US12170537Application Date: 2008-07-10
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Publication No.: US07655976B2Publication Date: 2010-02-02
- Inventor: Ji-Young Lee , Jun Seo
- Applicant: Ji-Young Lee , Jun Seo
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2007-0069349 20070710
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94

Abstract:
Provided are a field effect transistor, a method of manufacturing the same, and an electronic device including the field effect transistor. The field effect transistor may have a structure in which a double gate field effect transistor and a recess channel array transistor are formed in a single transistor in order to improve a short channel effect which occurs as field effect transistors become more highly integrated, a method of manufacturing the same, and an electronic device including the field effect transistor. The field effect transistor can exhibit stable device characteristics even when more highly integrated in such a manner that both the length and width of a channel increase and particularly the channel can be significantly long, and can be manufactured simply.
Public/Granted literature
- US20090014786A1 Field Effect Transistors Having Protruded Active Regions and Methods of Fabricating Such Transistors Public/Granted day:2009-01-15
Information query
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