Invention Grant
US07655976B2 Field effect transistors having protruded active regions and methods of fabricating such transistors 有权
具有突出的有源区的场效应晶体管和制造这种晶体管的方法

Field effect transistors having protruded active regions and methods of fabricating such transistors
Abstract:
Provided are a field effect transistor, a method of manufacturing the same, and an electronic device including the field effect transistor. The field effect transistor may have a structure in which a double gate field effect transistor and a recess channel array transistor are formed in a single transistor in order to improve a short channel effect which occurs as field effect transistors become more highly integrated, a method of manufacturing the same, and an electronic device including the field effect transistor. The field effect transistor can exhibit stable device characteristics even when more highly integrated in such a manner that both the length and width of a channel increase and particularly the channel can be significantly long, and can be manufactured simply.
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