Invention Grant
- Patent Title: Trench IGBT for highly capacitive loads
- Patent Title (中): 用于高容性负载的沟槽IGBT
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Application No.: US11252642Application Date: 2005-10-18
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Publication No.: US07655977B2Publication Date: 2010-02-02
- Inventor: Chiu Ng , Davide Chiola
- Applicant: Chiu Ng , Davide Chiola
- Applicant Address: US CA El Segundo
- Assignee: International Rectifier Corporation
- Current Assignee: International Rectifier Corporation
- Current Assignee Address: US CA El Segundo
- Agency: Farjami & Farjami LLP
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
An IGBT for controlling the application of power to a plasma display panel has an increased current conduction capability and a reduced conduction loss at the expense of a reduced safe operating area. For a device with a 300 volt breakdown voltage rating, the die has a substrate resistivity less than 10 m ohm cm; a buffer layer thickness of about 8 μm resistivity in the range of 0.05 to 0.10 ohm cm, and an epi layer for receiving junction patterns and trenches, which has a thickness of from 31 to 37 μm and resistivity in te range of 14 to 18 ohm cm.
Public/Granted literature
- US20070085148A1 Trench IGBT for highly capacitive loads Public/Granted day:2007-04-19
Information query
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