Invention Grant
US07656012B2 Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another 有权
用于半导体晶片处理的用于横向移位各个半导体器件彼此远离的装置

  • Patent Title: Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another
  • Patent Title (中): 用于半导体晶片处理的用于横向移位各个半导体器件彼此远离的装置
  • Application No.: US11409350
    Application Date: 2006-04-21
  • Publication No.: US07656012B2
    Publication Date: 2010-02-02
  • Inventor: Trung T. Doan
  • Applicant: Trung T. Doan
  • Applicant Address: US ID Boise
  • Assignee: Micron Technology, Inc.
  • Current Assignee: Micron Technology, Inc.
  • Current Assignee Address: US ID Boise
  • Agency: TraskBritt
  • Main IPC: H01L21/00
  • IPC: H01L21/00 H01L21/76
Apparatus for use in semiconductor wafer processing for laterally displacing individual semiconductor devices away from one another
Abstract:
A chip-scale or wafer-level-package, having passivation layers on substantially all surfaces thereof to form a hermetically sealed-package, is provided. The package may be formed by disposing a first passivation layer on the passive or backside surface of a semiconductor wafer. The semiconductor wafer may be attached to a flexible membrane and diced, such as by a wafer saw, to separate the semiconductor devices. Once diced, the flexible membrane may be stretched so as to laterally displace the individual semiconductor devices away from one another and substantially expose the side edges thereof. Once the side edges of the semiconductor devices are exposed, a passivation layer may be formed on the side edges and active surfaces of the devices. A portion of the passivation layer over the active surface of each semiconductor device may be removed so as to expose conductive elements formed therebeneath.
Information query
Patent Agency Ranking
0/0