Invention Grant
- Patent Title: Lithographic apparatus
- Patent Title (中): 平版印刷设备
-
Application No.: US11274888Application Date: 2005-11-16
-
Publication No.: US07656501B2Publication Date: 2010-02-02
- Inventor: Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Johannes Petrus Maria Smeulers
- Applicant: Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Johannes Petrus Maria Smeulers
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface which faces the substrate. The extractor assembly includes a plate which splits the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and a meniscus is formed in a lower channel between the plate and the substrate.
Public/Granted literature
- US20070109512A1 Lithographic apparatus Public/Granted day:2007-05-17
Information query
