Invention Grant
- Patent Title: Method for determining lithographic focus and exposure
- Patent Title (中): 确定光刻焦点和曝光的方法
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Application No.: US12101757Application Date: 2008-04-11
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Publication No.: US07656512B2Publication Date: 2010-02-02
- Inventor: Walter D. Mieher , Thaddeus G. Dziura , Ady Levy , Chris A. Mack
- Applicant: Walter D. Mieher , Thaddeus G. Dziura , Ady Levy , Chris A. Mack
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corporation
- Current Assignee: KLA-Tencor Technologies Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Weaver Austin Villeneuve & Sampson LLP
- Main IPC: G01B9/00
- IPC: G01B9/00 ; G01B11/24 ; G01B11/14 ; G01B11/04 ; G01B11/08
Abstract:
A method for determining one or more process parameter settings of a photolithographic system is disclosed.
Public/Granted literature
- US20080192221A1 METHOD FOR DETERMINING LITHOGRAPHIC FOCUS AND EXPOSURE Public/Granted day:2008-08-14
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