Invention Grant
US07656518B2 Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus
有权
测量散射仪中的不对称的方法，测量衬底中的重叠误差的方法和测量装置
- Patent Title: Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus
- Patent Title (中): 测量散射仪中的不对称的方法，测量衬底中的重叠误差的方法和测量装置
-
Application No.: US11729962Application Date: 2007-03-30
-
Publication No.: US07656518B2Publication Date: 2010-02-02
- Inventor: Arie Jeffrey Den Boef , Karel Diederick Van Der Mast , Maurits Van Der Schaar
- Applicant: Arie Jeffrey Den Boef , Karel Diederick Van Der Mast , Maurits Van Der Schaar
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01N21/00
- IPC: G01N21/00
Abstract:
In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.
Public/Granted literature
Information query
