Invention Grant
- Patent Title: Wafer edge inspection
- Patent Title (中): 晶圆边缘检查
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Application No.: US11848234Application Date: 2007-08-30
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Publication No.: US07656519B2Publication Date: 2010-02-02
- Inventor: Steven W. Meeks , Rusmin Kudinar
- Applicant: Steven W. Meeks , Rusmin Kudinar
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Luedeka, Neely & Graham, P.C.
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto an edge surface of a wafer, the radiation targeting assembly comprising a first expanded paraboloid or expanded ellipsoid reflector positioned adjacent the edge surface of the wafer, a reflected radiation collecting assembly that collects radiation reflected from the surface, a signal processing module to generate surface parameter data from the reflected radiation, and a defect detection module to analyze the surface parameter data to detect a defect on the surface.
Public/Granted literature
- US20090059236A1 Wafer Edge Inspection Public/Granted day:2009-03-05
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