Invention Grant
- Patent Title: Method for evaluating microstructures on a workpiece based on the orientation of a grating on the workpiece
- Patent Title (中): 基于工件上光栅的取向来评估工件上的微观结构的方法
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Application No.: US11372757Application Date: 2006-03-10
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Publication No.: US07656542B2Publication Date: 2010-02-02
- Inventor: Mike Littau , Darren Forman , Chris Raymond , Steven Hummel
- Applicant: Mike Littau , Darren Forman , Chris Raymond , Steven Hummel
- Applicant Address: US CA Milpitas
- Assignee: Nanometrics Incorporated
- Current Assignee: Nanometrics Incorporated
- Current Assignee Address: US CA Milpitas
- Agency: Silicon Valley Patent Group LLP
- Main IPC: G01B11/14
- IPC: G01B11/14

Abstract:
In a measuring system, a method for evaluating parameters of a workpiece includes measuring a periodic structure, such as a grating, on the workpiece to produce image data. An orientation of features in the image data, produced by higher order diffractions from the periodic structure, is identified. An orientation of the periodic structure is determined based on the orientation of the features in the image data. The image data is then modified, based on the orientation of the periodic structure, to correlate with, and for comparison to, simulated image data to ascertain parameters of the workpiece. Alternatively, optical components in the measuring system, or the workpiece itself, are adjusted to provide a desired alignment between the optical components and the periodic structure. A microstructure on the workpiece may then be measured, and the resulting image data may be compared to the simulated image data to ascertain parameters of the microstructure.
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