Invention Grant
- Patent Title: Scalable integrated circuit high density capacitors
- Patent Title (中): 可扩展集成电路高密度电容器
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Application No.: US11878696Application Date: 2007-07-26
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Publication No.: US07656643B2Publication Date: 2010-02-02
- Inventor: Victor Chiu-Kit Fong , Eric Bruce Blecker , Tom W. Kwan , Ning Li , Sumant Ranganathan , Chao Tang , Pieter Vorenkamp
- Applicant: Victor Chiu-Kit Fong , Eric Bruce Blecker , Tom W. Kwan , Ning Li , Sumant Ranganathan , Chao Tang , Pieter Vorenkamp
- Applicant Address: US CA Irvine
- Assignee: Broadcom Corporation
- Current Assignee: Broadcom Corporation
- Current Assignee Address: US CA Irvine
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: H01G4/228
- IPC: H01G4/228

Abstract:
The present invention provides several scalable integrated circuit high density capacitors and their layout techniques. The capacitors are scaled, for example, by varying the number of metal layers and/or the area of the metal layers used to form the capacitors. The capacitors use different metallization patterns to form the metal layers, and different via patterns to couple adjacent metal layers. In embodiments, optional shields are included as the top-most and/or bottom-most layers of the capacitors, and/or as side shields, to reduce unwanted parasitic capacitance.
Public/Granted literature
- US20080266749A1 Scalable integrated circuit high density capacitors Public/Granted day:2008-10-30
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