Invention Grant
- Patent Title: iTFC with optimized C(T)
- Patent Title (中): iTFC优化C(T)
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Application No.: US11972579Application Date: 2008-01-10
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Publication No.: US07656644B2Publication Date: 2010-02-02
- Inventor: Cengiz A. Palanduz , Dustin P. Wood
- Applicant: Cengiz A. Palanduz , Dustin P. Wood
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01G4/228
- IPC: H01G4/228

Abstract:
A method including depositing a suspension of a colloid having an amount of nano-particles of a ceramic material on a substrate; and thermally treating the suspension to form a thin film. A method including depositing a plurality of nano-particles of a ceramic material to pre-determined locations across a surface of a substrate; and thermally treating the plurality of nano-particles to form a thin film. A system including a computing device having a microprocessor, the microprocessor coupled to a printed circuit board through a substrate, the substrate having at least one capacitor structure formed on a surface, the capacitor structure having a first electrode, a second electrode, and a ceramic material disposed between the first electrode and the second electrode, wherein the ceramic material has columnar grains.
Public/Granted literature
- US20080106844A1 iTFC WITH OPTIMIZED C(T) Public/Granted day:2008-05-08
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