Invention Grant
- Patent Title: Method and apparatus for reviewing defects
- Patent Title (中): 检查缺陷的方法和装置
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Application No.: US11311254Application Date: 2005-12-20
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Publication No.: US07657078B2Publication Date: 2010-02-02
- Inventor: Ryo Nakagaki , Toshifumi Honda
- Applicant: Ryo Nakagaki , Toshifumi Honda
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2005-081507 20050322
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
An apparatus for reviewing defects including an image processing section (defect classification device section) with a function of estimating a non-defective state (reference image) of a portion in which the defect exists by use of a defect image, and a function of judging criticality or non-flat state of the defect by use of the estimation result. It becomes possible to establish both of a high-throughput image collecting sequence in which any reference image is not acquired and high-precision defect classification, and then to realize both of a high performance classifying function and a high-throughput image collecting function in a defect reviewing apparatus which automatically collects and classifies images of defects existing on a sample of a semiconductor wafer or the like.
Public/Granted literature
- US20060215901A1 Method and apparatus for reviewing defects Public/Granted day:2006-09-28
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