Invention Grant
- Patent Title: Lithographic apparatus and control method
- Patent Title (中): 光刻设备及控制方法
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Application No.: US11227445Application Date: 2005-09-16
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Publication No.: US07657334B2Publication Date: 2010-02-02
- Inventor: Youssef Karel Maria De Vos , Ronald Casper Kunst , Yin Tim Tso , Ramidin Izair Kamidi
- Applicant: Youssef Karel Maria De Vos , Ronald Casper Kunst , Yin Tim Tso , Ramidin Izair Kamidi
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G05B19/18
- IPC: G05B19/18 ; G05B11/32 ; G06F19/00

Abstract:
A lithographic apparatus includes a movable part and a controller to control a position quantity of the movable part. The controller includes a first controller transfer function and a second controller transfer function. A selector selects the first controller transfer function or the second controller transfer function depending on a state of the movable part. The first controller transfer function may be chosen in a substantially stationary state of the movable part, while in a substantially non-stationary state of the movable part, the second controller transfer function may be chosen.
Public/Granted literature
- US20070067057A1 Lithographic apparatus and control method Public/Granted day:2007-03-22
Information query
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