Invention Grant
- Patent Title: Semiconductor manufacturing apparatus and control method thereof
- Patent Title (中): 半导体制造装置及其控制方法
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Application No.: US11198313Application Date: 2005-08-08
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Publication No.: US07658200B2Publication Date: 2010-02-09
- Inventor: Jae-Sun Choi , Chi-Ho Han , Ki-Joong Jang , Jin-Su Jung
- Applicant: Jae-Sun Choi , Chi-Ho Han , Ki-Joong Jang , Jin-Su Jung
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2004-0064446 20040816
- Main IPC: F16K39/02
- IPC: F16K39/02

Abstract:
The present invention provides a semiconductor manufacturing apparatus having a slit valve control system including first and second process chambers disposed adjacent to each other, a slit aperture disposed between the first and second chambers, a slit valve to open and close the slit aperture between first and second chambers, an air source to operate the slit valve, a pressure supply flow path connecting the slit valve with the air source, and a pressure regulator installed on the supply flow path to regulate pressure supplied from the air source to the slit valve.
Public/Granted literature
- US20060034673A1 Semiconductor manufacturing apparatus and control method thereof Public/Granted day:2006-02-16
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