Invention Grant
- Patent Title: Gas lift chamber purge and vent valve and pump systems
- Patent Title (中): 气举室净化和排气阀和泵系统
-
Application No.: US11278249Application Date: 2006-03-31
-
Publication No.: US07658229B2Publication Date: 2010-02-09
- Inventor: Billy G. Becker , David A. Tucker
- Applicant: Billy G. Becker , David A. Tucker
- Applicant Address: US CA Ventura
- Assignee: BST Lift Systems, LLC
- Current Assignee: BST Lift Systems, LLC
- Current Assignee Address: US CA Ventura
- Agency: Locke Lord Bissell & Liddell, LLP
- Main IPC: E21B34/10
- IPC: E21B34/10 ; F04F1/08 ; F04F1/20

Abstract:
The present invention is directed to producing fluid from an oil or gas well by means of a combination intermittently filled down hole chamber accumulation device and a connected upper continuous gas lift flow system, separated by an inline one-way reverse flow check valve. A two-way purge and vent valve controls the distribution of high pressure gas. The two-way valve first injects high pressure gas into the chamber accumulation device to displace the fluid from the chamber into the continuous flow conduit. The two-way valve then vents the residual high pressure gas from the chamber into a separate low pressure conduit to the surface. The valve also provides high pressure gas to the continuous flow conduit to assist in the production of the fluid.
Public/Granted literature
- US20070235197A1 Gas Lift Chamber Purge and Vent valve and Pump Systems Public/Granted day:2007-10-11
Information query