Invention Grant
- Patent Title: Substrate processing apparatus
- Patent Title (中): 基板加工装置
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Application No.: US11273441Application Date: 2005-11-10
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Publication No.: US07658560B2Publication Date: 2010-02-09
- Inventor: Koji Kaneyama
- Applicant: Koji Kaneyama
- Applicant Address: JP
- Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee Address: JP
- Agency: Ostrolenk Faber LLP
- Priority: JP2004-326310 20041110
- Main IPC: G03D5/00
- IPC: G03D5/00 ; G03B27/52

Abstract:
An interface transport mechanism uses an upper hand when transporting a substrate from a substrate platform to an exposure device before exposure processing by an exposure device, and uses a lower hand when transporting the substrate from the exposure device to the substrate platform after the exposure processing by the exposure device. That is, the lower hand is used to transport a substrate to which a liquid is attached after exposure processing, and the upper hand is used to transport a substrate to which no liquid is attached before exposure processing.
Public/Granted literature
- US20060098977A1 Substrate processing apparatus and substrate processing method Public/Granted day:2006-05-11
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