Invention Grant
- Patent Title: Gas distribution assembly for use in a semiconductor work piece processing reactor
- Patent Title (中): 用于半导体工件处理反应器的气体分配组件
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Application No.: US11602568Application Date: 2006-11-20
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Publication No.: US07658800B2Publication Date: 2010-02-09
- Inventor: AiHua Chen , Shulin Wang , Henry Ho , Gerald Yin , Qing Lv , Li Fu
- Applicant: AiHua Chen , Shulin Wang , Henry Ho , Gerald Yin , Qing Lv , Li Fu
- Applicant Address: KY Georgetown, Grand Cayman
- Assignee: Advanced Micro-Fabrication Equipment, Inc. Asia
- Current Assignee: Advanced Micro-Fabrication Equipment, Inc. Asia
- Current Assignee Address: KY Georgetown, Grand Cayman
- Agency: Nixon Peabody LLP
- Agent Joseph Bach, Esq.
- Priority: CN200610117260 20061018
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01L21/306
Abstract:
A semiconductor work piece processing reactor is described and which includes a processing chamber defining a deposition region; a pedestal which supports and moves a semiconductor work piece to be processed within the deposition region of the processing chamber; and a gas distribution assembly mounted within the processing chamber and which defines first and second reactive gas passageways which are separated from each other, and which deliver two reactant gases to a semiconductor work piece which is positioned near the gas distribution assembly.
Public/Granted literature
- US20080092815A1 Gas distribution assembly for use in a semiconductor work piece processing reactor Public/Granted day:2008-04-24
Information query
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