Invention Grant
- Patent Title: SiOx:Si composite articles and methods of making same
- Patent Title (中): SiOx:Si复合制品及其制备方法
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Application No.: US11201781Application Date: 2005-08-11
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Publication No.: US07658822B2Publication Date: 2010-02-09
- Inventor: David E. Stevenson , Li Q. Zhou
- Applicant: David E. Stevenson , Li Q. Zhou
- Applicant Address: US MI Ann Arbor
- Assignee: Wintek Electro-Optics Corporation
- Current Assignee: Wintek Electro-Optics Corporation
- Current Assignee Address: US MI Ann Arbor
- Agency: Dickinson Wright, PLLC
- Agent Robert L. Stearns
- Main IPC: H01L21/31
- IPC: H01L21/31

Abstract:
Article are made from silicon oxide and electrically conductive doped silicon materials that are joined in a protective environment to yield a composite SiOx:Si material that exhibits the properties of SiOx and yet is electrically conductive due to the presence of the Si. Articles from such composite materials find many uses, such as for targets for DC and/or AC sputtering processes to produce silicon oxide thin films for touch-screen application, barrier thin films in LCD displays and optical thin films used in a wide variety of applications.
Public/Granted literature
- US20070037404A1 SiOx:Si composite articles and methods of making same Public/Granted day:2007-02-15
Information query
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