Invention Grant
- Patent Title: Silicone composition and a pressure sensitive adhesive film having a pressure sensitive adhesive layer made from the composition
- Patent Title (中): 硅酮组合物和具有由该组合物制成的压敏粘合剂层的压敏粘合剂膜
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Application No.: US11258895Application Date: 2005-10-27
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Publication No.: US07659003B2Publication Date: 2010-02-09
- Inventor: Shunji Aoki , Akira Yamamoto
- Applicant: Shunji Aoki , Akira Yamamoto
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2004-314694 20041028; JP2005-311174 20051026
- Main IPC: B32B9/04
- IPC: B32B9/04

Abstract:
A pressure sensitive adhesive film comprising a substrate film and a pressure sensitive adhesive layer formed on a surface of the substrate film, said pressure sensitive adhesive layer being prepared from (A) a silicone composition comprising a diorganopolysiloxane having at least two alkenyl groups per molecule and (C) a polyorganosiloxane having an SiH bond, characterized in that the alkenyl groups are contained in an amount of from 0.0007 to 0.05 mole per 100 g of the diorganopolysiloxane (A) and that the polyorganosiloxane (C) is contained in such an amount that a molar ratio of the SiH bond to the alkenyl group of the diorganopolysiloxane (A) ranges from 0.5 to 20.
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