Invention Grant
US07659051B2 Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer
有权
具有抗反射性的聚合物，包含其的硬掩模组合物以及用于形成图案化材料层的方法
- Patent Title: Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer
- Patent Title (中): 具有抗反射性的聚合物，包含其的硬掩模组合物以及用于形成图案化材料层的方法
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Application No.: US12003731Application Date: 2007-12-31
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Publication No.: US07659051B2Publication Date: 2010-02-09
- Inventor: Kyong Ho Yoon , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyung Hee Hyung , Min Soo Kim , Jin Kuk Lee
- Applicant: Kyong Ho Yoon , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyung Hee Hyung , Min Soo Kim , Jin Kuk Lee
- Applicant Address: KR Gumi-si, Gyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-si, Gyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2006-0138418 20061229
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/11 ; C08G61/00 ; C08G10/00
Abstract:
A naphthalene-backbone polymer represented by Formula 1: wherein n and m are independently at least 1 and less than about 190, R1 is a hydrogen, a hydroxyl, a hydrocarbon group of about 10 carbons or less, or a halogen, R2 is methylene or includes an aryl linking group, R3 is a conjugated diene group, and R4 is an unsaturated dienophile group.
Public/Granted literature
Information query
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