Invention Grant
- Patent Title: Structure capable of use for generation or detection of electromagnetic radiation, optical semiconductor device, and fabrication method of the structure
- Patent Title (中): 能够用于电磁辐射的产生或检测的结构,光学半导体器件以及该结构的制造方法
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Application No.: US11088719Application Date: 2005-03-25
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Publication No.: US07659137B2Publication Date: 2010-02-09
- Inventor: Shintaro Kasai , Toshihiko Ouchi , Masatoshi Watanabe , Mitsuru Ohtsuka , Taihei Mukaide
- Applicant: Shintaro Kasai , Toshihiko Ouchi , Masatoshi Watanabe , Mitsuru Ohtsuka , Taihei Mukaide
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2004-092400 20040326; JP2005-058438 20050303
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A fabrication method of fabricating a structure capable of being used for generation or detection of electromagnetic radiation includes a forming step of forming a layer containing a compound semiconductor on a substrate at a substrate temperature below about 300° C., a first heating step of heating the substrate with the layer in an ambience containing arsenic, and a second heating step of heating the substrate with the layer at the substrate temperature above about 600° C. in a gas ambience incapable of chemically reacting on the compound semiconductor. Structures of the present invention capable of being used for generation or detection of electromagnetic radiation can be fabricated using the fabrication method by appropriately regulating the substrate temperature, the heating time, the gas ambience and the like in the second heating step.
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