Invention Grant
US07659155B2 Method of forming a transistor having gate and body in direct self-aligned contact
失效
形成具有直接自对准接触的门和体的晶体管的方法
- Patent Title: Method of forming a transistor having gate and body in direct self-aligned contact
- Patent Title (中): 形成具有直接自对准接触的门和体的晶体管的方法
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Application No.: US11683470Application Date: 2007-03-08
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Publication No.: US07659155B2Publication Date: 2010-02-09
- Inventor: Brent A. Anderson , Andres Bryant , William F. Clark, Jr. , Edward J. Nowak
- Applicant: Brent A. Anderson , Andres Bryant , William F. Clark, Jr. , Edward J. Nowak
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Hoffman Warnick LLC
- Agent Anthony J. Canale
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A transistor having a directly contacting gate and body and related methods are disclosed. In one embodiment, the transistor includes a gate; a body; and a dielectric layer extending over the body to insulate the gate from the body along an entire surface of the body except along a portion of at least a sidewall of the body, wherein the gate is in direct contact with the body at the portion. One method may include providing the body; forming a sacrificial layer that contacts at least a portion of a sidewall of the body; forming a dielectric layer about the body except at the at least a portion; removing the sacrificial layer; and forming the gate about the body such that the gate contacts the at least a portion of the sidewall of the body.
Public/Granted literature
- US20080217707A1 TRANSISTOR HAVING GATE AND BODY IN DIRECT SELF-ALIGNED CONTACT AND RELATED METHODS Public/Granted day:2008-09-11
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