Invention Grant
- Patent Title: Method of fabricating a field effect transistor
- Patent Title (中): 制作场效应晶体管的方法
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Application No.: US10532190Application Date: 2003-10-29
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Publication No.: US07659165B2Publication Date: 2010-02-09
- Inventor: Rolf Koenenkamp
- Applicant: Rolf Koenenkamp
- Applicant Address: DE Berlin
- Assignee: Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH
- Current Assignee: Helmholtz-Zentrum Berlin fuer Materialien und Energie GmbH
- Current Assignee Address: DE Berlin
- Agency: Darby & Darby
- Priority: DE10250984 20021029
- International Application: PCT/DE03/03673 WO 20031029
- International Announcement: WO2004/040616 WO 20040513
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
A field effect transistor in which at least one vertically arranged semiconductor column, with a diameter in the nanometer range, is located between a source and a contact and has an annular surround of a gate contact with retention of an insulation gap. A simplified production method is disclosed and the transistor produced thus is embodied such that the semiconductor columns are embedded in a first and a second insulation layer, between which a metal layer, running to the outside as a gate contact, is arranged, the ends of which, extending upwards through the second insulation layer, are partly converted into an insulator, or removed and replaced by an insulation material.
Public/Granted literature
- US20060118975A1 Field effect transistor and method for production thereof Public/Granted day:2006-06-08
Information query
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