Soluble hard mask for interlayer dielectric patterning

Invention Grant

US07659196B2 Soluble hard mask for interlayer dielectric patterning 失效

Title translation: 可溶性硬掩模用于层间电介质图案化

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Patent Title: Soluble hard mask for interlayer dielectric patterning
Patent Title (中): 可溶性硬掩模用于层间电介质图案化
Application No.: US11643483

Application Date: 2006-12-20
Publication No.: US07659196B2

Publication Date: 2010-02-09
Inventor: Magdy S. Abdelrahman , Makarem A. Hussein
Applicant: Magdy S. Abdelrahman , Makarem A. Hussein
Applicant Address: US CA Santa Clara
Assignee: Intel Corporation
Current Assignee: Intel Corporation
Current Assignee Address: US CA Santa Clara
Agency: Blakely, Sokoloff, Taylor & Zafman LLP
Main IPC: H01L21/4763
IPC: H01L21/4763 ; H01L21/44 ; H01L21/311

Soluble hard mask for interlayer dielectric patterning

Abstract:

Described herein are embodiments of a method that includes forming a hard mask over an interlayer dielectric layer, patterning said hard mask, etching said interlayer dielectric layer, and removing said hard mask during a post-etch clean with a wet etchant having a selectivity to etch said hard mask at a greater rate than said interlayer dielectric layer.

Abstract(Chinese):

这里描述的方法的实施例包括在层间电介质层上形成硬掩模，图案化所述硬掩模，蚀刻所述层间电介质层，以及在用蚀刻选择性的湿式蚀刻剂的蚀刻前清洁期间去除所述硬掩模所述硬掩模以比所述层间电介质层更大的速率。

Public/Granted literature

US20080153283A1 Soluble hard mask for interlayer dielectric patterning Public/Granted day:2008-06-26

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/02	.半导体器件或其部件的制造或处理
H01L21/04	..至少具有一个跃变势垒或表面势垒的器件，例如PN结、耗尽层、载体集结层
H01L21/34	...具有H01L21/06，H01L21/16及H01L21/18各组不包含的或有或无杂质，例如掺杂材料的半导体的器件
H01L21/46	....用H01L21/36至H01L21/428各组不包含的方法或设备处理半导体材料的（在半导体材料上制作电极的入H01L21/44）
H01L21/461	.....改变半导体材料的表面物理特性或形状的，例如腐蚀、抛光、切割
H01L21/4763	......非绝缘层的沉积，例如绝缘层上的导电层、电阻层；这些层的后处理（电极的制造入H01L21/28）