Invention Grant
- Patent Title: Antireflective coating composition, antireflection film, and fabrication method thereof
- Patent Title (中): 防反射涂料组合物,抗反射膜及其制造方法
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Application No.: US11221914Application Date: 2005-09-09
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Publication No.: US07659352B2Publication Date: 2010-02-09
- Inventor: Wu-Jing Wang , Yen-Po Wang , Yun-Ching Lee , Joung-Yei Chen , Hsi-Hsin Shih
- Applicant: Wu-Jing Wang , Yen-Po Wang , Yun-Ching Lee , Joung-Yei Chen , Hsi-Hsin Shih
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW93134444A 20041111
- Main IPC: C08F30/08
- IPC: C08F30/08

Abstract:
An antireflective coating composition, antireflection films and fabrication method thereof. The antireflection film is constructed by stacked crosslink colloid particles, having a plurality of nanopores distributed uniformly therein. Due to the nanopores, the antireflection film has a refractive index less than 1.45, reducing the reflectivity of less than 3.0%. Furthermore, since the antireflection film comprises crosslink oxide colloid, the film exhibits superior mechanical strength and is suitable for use in display devices.
Public/Granted literature
- US20060099407A1 Antireflective coating composition, antireflection film, and fabrication method thereof Public/Granted day:2006-05-11
Information query
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