Invention Grant
- Patent Title: Process for producing 2-acylthiophene compound
- Patent Title (中): 2-酰基噻吩化合物的制备方法
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Application No.: US10579734Application Date: 2004-12-13
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Publication No.: US07659411B2Publication Date: 2010-02-09
- Inventor: Seiji Bando , Syuzo Satake , Hirokazu Kagano
- Applicant: Seiji Bando , Syuzo Satake , Hirokazu Kagano
- Applicant Address: JP Hyogo
- Assignee: Sumitomo Seika Chemicals Co., Ltd.
- Current Assignee: Sumitomo Seika Chemicals Co., Ltd.
- Current Assignee Address: JP Hyogo
- Agency: Posz Law Group, PLC
- Priority: JP2003-419362 20031217
- International Application: PCT/JP2004/018569 WO 20041213
- International Announcement: WO2005/058866 WO 20050630
- Main IPC: C07D333/28
- IPC: C07D333/28 ; C07D333/22 ; A61K31/38 ; A01N43/06

Abstract:
The present invention provides a process for producing a 2-acylthiophene compound which has a low content of the 3-isomer generated as a by-product, the process comprising reacting a thiophene compound represented by formula (1): wherein R1is a hydrogen atom, a C1-6 alkyl group, a phenyl group, or a halogen atom, with at least one member selected from the group consisting of acid anhydrides represented by formula (2): wherein R2 is a C1-6 alkyl group or a phenyl group, and acid halides represented by formula (3): wherein R2 is as defined above and X is a halogen atom, in the presence of a solid acid catalyst at a temperature less than 75° C. in the absence of solvent, thus producing a 2-acylthiophene compound represented by formula (4): wherein R1 and R2 are as defined above.
Public/Granted literature
- US20070149787A1 Process for producing 2-acylthiophene compound Public/Granted day:2007-06-28
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