Invention Grant
- Patent Title: Apparatus and method for controlled particle beam manufacturing
- Patent Title (中): 受控粒子束制造的装置和方法
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Application No.: US11841565Application Date: 2007-08-20
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Publication No.: US07659526B2Publication Date: 2010-02-09
- Inventor: Michael John Zani , Mark Joseph Bennahmias , Mark Anthony Mayse , Jeffrey Winfield Scott
- Applicant: Michael John Zani , Mark Joseph Bennahmias , Mark Anthony Mayse , Jeffrey Winfield Scott
- Applicant Address: US CA Laguna Niguel
- Assignee: NexGen Semi Holding, Inc.
- Current Assignee: NexGen Semi Holding, Inc.
- Current Assignee Address: US CA Laguna Niguel
- Agency: Knobbe, Martens Olson & Bear, LLP
- Main IPC: H01J37/141
- IPC: H01J37/141

Abstract:
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
Public/Granted literature
- US20070284537A1 APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING Public/Granted day:2007-12-13
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