Invention Grant
- Patent Title: Semiconductor light-emitting device and method of fabricating the same
- Patent Title (中): 半导体发光器件及其制造方法
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Application No.: US11798873Application Date: 2007-05-17
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Publication No.: US07659557B2Publication Date: 2010-02-09
- Inventor: Chiung-Chi Tsai , Tzong-Liang Tsai , Yu-Chu Li
- Applicant: Chiung-Chi Tsai , Tzong-Liang Tsai , Yu-Chu Li
- Applicant Address: TW Taichung
- Assignee: Huga Optotech Inc.
- Current Assignee: Huga Optotech Inc.
- Current Assignee Address: TW Taichung
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW95127869A 20060728
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
The invention provides a semiconductor light-emitting device with II-V group (or II-IV-V group) compound contact layer and a method of fabricating the same. The semiconductor light-emitting device according to a preferred embodiment of the invention includes a substrate, a first conductive type semiconductor material layer, a light-emitting layer, a first electrode, a second conductive type semiconductor material layer, a II-V group (or II-IV-V group) compound contact layer, a transparent conductive layer, and a second electrode. The existence of the II-V group (or II-IV-V group) compound contact layer improves the ohmic contact between the second conductive type semiconductor material layer and the transparent conductive layer.
Public/Granted literature
- US20080023709A1 Semiconductor light-emitting device and method of fabricating the same Public/Granted day:2008-01-31
Information query
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