Invention Grant
- Patent Title: Silicon controlled rectifier electrostatic discharge clamp for a high voltage laterally diffused MOS transistor
- Patent Title (中): 用于高压横向扩散MOS晶体管的可控硅整流器静电放电钳
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Application No.: US11233959Application Date: 2005-09-23
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Publication No.: US07659558B1Publication Date: 2010-02-09
- Inventor: Andrew J. Walker , Helmut Puchner
- Applicant: Andrew J. Walker , Helmut Puchner
- Applicant Address: US CA San Jose
- Assignee: Cypress Semiconductor Corporation
- Current Assignee: Cypress Semiconductor Corporation
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/84
- IPC: H01L21/84

Abstract:
Devices for protecting drain extended metal oxide semiconductor (DEMOS) output transistors from damage caused by electrostatic discharge (ESD) events are provided. In general, the devices include a silicon controlled rectifier (SCR) and a DEMOS transistor configured to breakdown at a lower voltage than a breakdown voltage of the output driver transistor it is configured to protect. The devices further include a pair of ohmic regions configured to trigger the SCR upon breakdown of the drain contact region of the DEMOS transistor and a collection region configured to collect charge generated by the SCR. The transistor, the pair of ohmic regions, and the SCR are respectively configured and arranged to independently set the breakdown voltage of the drain contact region, the trigger voltage of the SCR, and the holding voltage of the SCR. One of the ohmic regions may be coupled to the drain contact region of the transistor.
Information query
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