Invention Grant
US07659596B2 Lateral high-voltage devices with optimum variation lateral flux by using field plate
有权
横向高压装置,通过使用现场板具有最佳变化的横向通量
- Patent Title: Lateral high-voltage devices with optimum variation lateral flux by using field plate
- Patent Title (中): 横向高压装置,通过使用现场板具有最佳变化的横向通量
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Application No.: US11753930Application Date: 2007-05-25
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Publication No.: US07659596B2Publication Date: 2010-02-09
- Inventor: Xingbi Chen
- Applicant: Xingbi Chen
- Applicant Address: CN Cheng du, Sichuan
- Assignee: University of Electronic Science & Technology
- Current Assignee: University of Electronic Science & Technology
- Current Assignee Address: CN Cheng du, Sichuan
- Agency: Locke Lord Bissell & Liddell, LLP
- Priority: CN200610138829 20060919
- Main IPC: H01L23/58
- IPC: H01L23/58

Abstract:
A semiconductor lateral voltage-sustaining region and devices based thereupon. The voltage-sustaining region is made by using the Metal-Insulator-Semiconductor capacitance formed by terrace field plate to emit or to absorb electric flux on the semiconductor surface, so that the effective electric flux density emitted from the semiconductor surface to the substrate approaches approximately the optimum distribution, and a highest breakdown voltage can be achieved within a smallest distance on the surface. The field plate(s) can be either connected to an electrode or floating ones, or connected to floating field limiting rings. Coupling capacitance between different plates can also be used to change the flux distribution.
Public/Granted literature
- US20080067624A1 LATERAL HIGH-VOLTAGE DEVICES WITH OPTIMUM VARIATION LATERAL FLUX BY USING FIELD PLATE Public/Granted day:2008-03-20
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