Invention Grant
- Patent Title: Semiconductor device
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Application No.: US11771779Application Date: 2007-06-29
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Publication No.: US07659769B2Publication Date: 2010-02-09
- Inventor: Hiroaki Nakaya , Satoru Akiyama , Tomonori Sekiguchi , Riichiro Takemura
- Applicant: Hiroaki Nakaya , Satoru Akiyama , Tomonori Sekiguchi , Riichiro Takemura
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2006-234896 20060831
- Main IPC: G05F1/10
- IPC: G05F1/10

Abstract:
A substrate voltage control technique that prevents the operating speed from being decreased and suppresses a leakage current due to a lower threshold voltage with respect to a low voltage use. Since a center value of the threshold voltages is detected by plural replica MOS transistors, and a substrate voltage is controlled to control a center value of the threshold voltages, thereby making it possible to satisfy a lower limit of the operating speed and an upper limit of a leakage current of the entire chip. On the other hand, the substrate voltage is dynamically controlled during the operation of the chip, thereby making it possible to decrease the center value of the threshold voltages when the chip operates to improve the speed, and to increase the center value of the threshold voltages after the operation of the chip to reduce the leakage current of the entire chip.
Public/Granted literature
- US20080054262A1 SEMICONDUCTOR DEVICE Public/Granted day:2008-03-06
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