Invention Grant
US07659974B2 System and method for controlling light scattered from a workpiece surface in a surface inspection system
有权
用于控制表面检查系统中从工件表面散射的光的系统和方法
- Patent Title: System and method for controlling light scattered from a workpiece surface in a surface inspection system
- Patent Title (中): 用于控制表面检查系统中从工件表面散射的光的系统和方法
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Application No.: US12142850Application Date: 2008-06-20
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Publication No.: US07659974B2Publication Date: 2010-02-09
- Inventor: Richard Earl Bills , James Peter McNiven
- Applicant: Richard Earl Bills , James Peter McNiven
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Luedeka, Neely & Graham, P.C.
- Main IPC: G01N21/88
- IPC: G01N21/88
Abstract:
In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target a radiation beam onto a surface; and a scattered radiation collecting assembly that collects radiation scattered from the surface. The radiation targeting assembly generates primary and secondary beams. Data collected from the reflections of the primary and secondary beams may be used in a dynamic range extension routine, alone or in combination with a power attenuation routine.
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