Invention Grant
- Patent Title: Devices and methods for inspecting optical elements with a view to contamination
- Patent Title (中): 为了污染而检查光学元件的装置和方法
-
Application No.: US11635293Application Date: 2006-12-07
-
Publication No.: US07659976B2Publication Date: 2010-02-09
- Inventor: Julian Kaller , Herbert Fink , Christoph Zaczek , Wolfgang Rupp
- Applicant: Julian Kaller , Herbert Fink , Christoph Zaczek , Wolfgang Rupp
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agent Walter A. Hackler
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
Described is an examination system (1) for locating contamination (2) on an optical element (4) installed in an optical system (5), which examination system (1) comprises: a spatially resolving detector (6); imaging optics (7) that magnify in particular at a magnification of between 2 times and 100 times, for magnified imaging of a surface sub-region (3a) of the optical element (4) on the spatially resolving detector (6); as well as a movement mechanism (12), in particular a motorized movement mechanism (12), for displacing the imaging optics (7) together with the detector (6) relative to the surface (3) of the optical element (4) such that any desired surface sub-region of the surface (3) can be imaged at magnification.
Public/Granted literature
- US20070132989A1 Devices and methods for inspecting optical elements with a view to contamination Public/Granted day:2007-06-14
Information query