Invention Grant
- Patent Title: Focus determination for laser-mask imaging systems
- Patent Title (中): 激光掩模成像系统的聚焦确定
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Application No.: US11824090Application Date: 2007-06-29
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Publication No.: US07659989B2Publication Date: 2010-02-09
- Inventor: Thomas Wenzel
- Applicant: Thomas Wenzel
- Applicant Address: US CA Santa Clara
- Assignee: Coherent, Inc.
- Current Assignee: Coherent, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Morrison & Foerster LLP
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A system and method for calibrating the focal position of the imaging plane of a sequential lateral solidification (SLS) system. A test pattern is formed on a test substrate while varying the z-position of the focal position. Information concerning the z-position of the focal position is stored by a data processing system for various positions in the test pattern. An inspection light beam is directed onto the test pattern at a predetermined angle. The reflection of the inspection light beam is detected by an optical detector. The data processing system analyzes the reflection and determines whether the reflected light is substantially specular or substantially scattered. The data processing system uses the analysis of the reflected light and the information concerning the z-position of the focal position to select an optimal focal position for calibrating the SLS system.
Public/Granted literature
- US20090002687A1 Focus determination for laser-mask imaging systems Public/Granted day:2009-01-01
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