Invention Grant
- Patent Title: Substrate holding system and exposure apparatus using the same
- Patent Title (中): 基板保持系统和使用其的曝光装置
-
Application No.: US12334697Application Date: 2008-12-15
-
Publication No.: US07660098B2Publication Date: 2010-02-09
- Inventor: Atsushi Ito , Keiji Emoto
- Applicant: Atsushi Ito , Keiji Emoto
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2003-343676 20031001
- Main IPC: H01T23/00
- IPC: H01T23/00
Abstract:
A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.
Public/Granted literature
- US20090103232A1 Substrate Holding System and Exposure Apparatus Using the Same Public/Granted day:2009-04-23
Information query
