Invention Grant
- Patent Title: Layout structures and methods of fabricating layout structures
- Patent Title (中): 制作布局结构的布局结构和方法
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Application No.: US11878066Application Date: 2007-07-20
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Publication No.: US07660141B2Publication Date: 2010-02-09
- Inventor: Soo-bong Chang
- Applicant: Soo-bong Chang
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd
- Current Assignee: Samsung Electronics Co., Ltd
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, PLC
- Priority: KR10-2006-0096132 20060929
- Main IPC: G11C5/06
- IPC: G11C5/06

Abstract:
Example embodiments may provide a layout structure and layout method for a memory device that may reduce the area of the memory device. Example embodiment layout structures may include a first region and/or a second region. First and second sensing MOS transistors of a sense amplifier that senses data of a bit line and a complementary bit line may be arranged in the first region. First, second and third equalization MOS transistors of an equalizer that equalizes the bit line and the complementary bit line may be arranged In the second region located apart from the first region, Sensing NMOS transistors and equalization NMOS transistors may share an N-type active region in the layout structure of a memory device, and the area of a sense amplifier may be reduced.
Public/Granted literature
- US20080080282A1 Layout structures and methods of fabricating layout structures Public/Granted day:2008-04-03
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