Invention Grant
- Patent Title: Gas tight radiation window, and a method for its manufacturing
- Patent Title (中): 气密辐射窗及其制造方法
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Application No.: US11820433Application Date: 2007-06-19
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Publication No.: US07660393B2Publication Date: 2010-02-09
- Inventor: Heikki Johannes Sipilä , Seppo Nenonen
- Applicant: Heikki Johannes Sipilä , Seppo Nenonen
- Applicant Address: FI
- Assignee: Oxford Instruments Analytical Oy
- Current Assignee: Oxford Instruments Analytical Oy
- Current Assignee Address: FI
- Agency: Wood, Phillips, Katz, Clark & Mortimer
- Main IPC: H01J5/18
- IPC: H01J5/18

Abstract:
A gas tight radiation window membrane comprises a layered diffusion barrier with a reactive metal layer (201) covered on both sides by cover layers (202, 203). An originally continuous carrier layer (101) can be made a mesh that has openings coincident with openings of a reinforcement grid (105), while the gas tight diffusion barrier (107, 507) spans as a continuous film over said openings in said mesh.
Public/Granted literature
- US20080317209A1 Gas tight radiation window, and a method for its manufacturing Public/Granted day:2008-12-25
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