Invention Grant
US07660456B2 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
有权
掩模制造支持方法，掩模空白提供方法和掩模空白处理系统
- Patent Title: Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
- Patent Title (中): 掩模制造支持方法，掩模空白提供方法和掩模空白处理系统
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Application No.: US10592320Application Date: 2005-03-07
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Publication No.: US07660456B2Publication Date: 2010-02-09
- Inventor: Hiroyuki Ishida , Tamiya Aiyama , Koichi Maruyama
- Applicant: Hiroyuki Ishida , Tamiya Aiyama , Koichi Maruyama
- Applicant Address: JP Tokyo
- Assignee: Hoya Corporation
- Current Assignee: Hoya Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- International Application: PCT/JP2005/003901 WO 20050307
- International Announcement: WO2005/085951 WO 20050915
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G03F1/00 ; G06F17/50
Abstract:
A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
Public/Granted literature
- US20070178387A1 Mask fabrication supporting method, mask blank providing method, and mask blank dealing system Public/Granted day:2007-08-02
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