Invention Grant
- Patent Title: Interspinous process implants and methods of use
- Patent Title (中): 椎间植入植入物和使用方法
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Application No.: US11771099Application Date: 2007-06-29
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Publication No.: US07662187B2Publication Date: 2010-02-16
- Inventor: James F. Zucherman , Ken Y. Hsu , Charles J. Winslow , Scott A. Yerby , John J. Flynn , Steven T. Mitchell , John A. Markwart
- Applicant: James F. Zucherman , Ken Y. Hsu , Charles J. Winslow , Scott A. Yerby , John J. Flynn , Steven T. Mitchell , John A. Markwart
- Applicant Address: CH Neuchatel
- Assignee: Kyphon SARL
- Current Assignee: Kyphon SARL
- Current Assignee Address: CH Neuchatel
- Agency: Coats and Bennett, P.L.L.C.
- Main IPC: A61F2/44
- IPC: A61F2/44

Abstract:
Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.
Public/Granted literature
- US20080033560A1 INTERSPINOUS PROCESS IMPLANTS AND METHODS OF USE Public/Granted day:2008-02-07
Information query
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